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AC5591 Electrostatic Chuck (Al2O3, SiO2, MgO)

Catalog No. AC5591
Main Composition Al2O3, SiO2, MgO
Size Dia. 300 mm, etc.
Density 3.77 g/cm3
Al2O3 Content 96%

Electrostatic Chuck is a crucial component used in semiconductor manufacturing equipment, particularly in plasma etching, chemical vapor deposition (CVD), and physical vapor deposition (PVD) processes. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Electrostatic Chucks.

Related products: Electrostatic Chuck (Al2O3, AlN, Sapphire), Electrostatic Chuck (Al2O3)

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Electrostatic Chuck (Al2O3, SiO2, MgO)
Electrostatic Chuck (Al2O3, SiO2, MgO)
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