Electrostatic Chuck Description
Electrostatic Chuck (ESC) is a crucial component used in semiconductor manufacturing equipment, particularly in plasma etching, chemical vapor deposition (CVD), and physical vapor deposition (PVD) processes. It serves to hold and release semiconductor wafers or substrates securely during processing. The ESC operates based on electrostatic force; when a voltage is applied, it generates an electrostatic field that clamps the wafer in place without physical contact, providing uniform wafer cooling and heating, as well as excellent flatness and minimal backside contamination.
Al2O3 (Aluminum Oxide), SiO2 (Silicon Dioxide), and MgO (Magnesium Oxide), are typically used as dielectric layers or components in the construction of electrostatic chucks due to their excellent electrical insulation properties, thermal stability, and chemical resistance.
Electrostatic Chuck Specifications
Chemical Composition
|
Al2O3, SiO2, MgO
|
Al2O3 Content %
|
96
|
Density (g/cm3)
|
3.77
|
Porosity %
|
0.19
|
Grain Size (μm)
|
4.0
|
Pore Size (μm)
|
<10
|
Volume Resistivity
|
>1.0E15@RT
|
Vickers hardness
|
1350HV
|
Flexural Strength
|
364MPa
|
Cte
|
7.67x10-6/℃
|
Thermal Conductivity
|
21.45 W/(m·K) @25℃
|
CP
|
0.760 J/g·k
|
Dielectric Constant
|
9.38 @ 1
|
Electrostatic Chuck Applications
- Plasma Etching: ESCs are extensively used in plasma etching processes to securely hold semiconductor wafers in place.
- Chemical Vapor Deposition (CVD): In CVD processes, ESCs help maintain the wafer in a fixed position under high temperatures and reactive chemical environments.
- Physical Vapor Deposition (PVD): For PVD processes, ESCs ensure that wafers are held flat and stable, facilitating uniform metal or dielectric layer deposition.
- Ion Implantation: ESCs are used to hold wafers during ion implantation, where ions are embedded into the wafer surface to alter its electrical properties. The chuck ensures accurate positioning and stability of the wafer under the beam of ions.
- Photolithography: Although less common than in etching and deposition processes, ESCs can also be used in photolithography to hold wafers steady during the exposure to light patterns. Stability is crucial for achieving the high precision needed in patterning.
Electrostatic Chuck Packaging
Our Electrostatic Chuck is carefully handled during storage and transportation to preserve the quality of our product in its original condition.