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What can we expect to Acquire from the Sputtering Technique in the future?

The sputtering technique originated in 1842 when Grove studied cathode corrosion in the laboratory of electronic tubes and found that cathode materials had migrated to the wall of vacuum tubes. However, the physical mechanism of sputtering was not very clear because of the backward experimental equipment at that time. The magnetron sputtering technology emerged in the 1970s, and commercial sputtering equipment was used in small production. The current sputtering technology has become a fairly mature technology and is widely used in semiconductor, photovoltaic, display and other industries.

Semiconductor Industry

High-purity sputtering target is rising with the development of the semiconductor industry, and integrated circuit industry has become one of the main application fields of high purity sputtering target.

With the rapid development of information technology, the integration degree of the integrated circuit is required to be improved and the size of the unit device in the circuit is reduced. The interior of each unit device consists of the substrate, insulation layer, media layer, conductor layer and the protective layer, the media layer, the conductor layer and even the protective layer in which all rely on sputtering coating technology, so sputtering target is one of the core materials for the preparation of integrated circuits.

Semiconductor Industry

FPD Industry

The coating is the basic link of modern flat panel display (FPD) industry. Almost all types of flat panel display devices use a large number of coated materials to form various functional films, so as to ensure the uniformity of large area of film layers while improving productivity and reducing costs. The PVD coating materials used are mainly sputtering target materials. Many properties of flat panel display, such as resolution and transmittance, are closely related to the performance of the sputtering film.

PVD coating materials are mainly used in the production of the display panel and touch panel. In the production process of flat panel display, the glass substrate shall be formed into ITO glass after repeated sputtering, and the ITO glass shall be coated, processed and assembled for the production of LCD panel, PDP panel and OLED panel. For the production of the touch screen, the ITO glass needs to be processed, coated to form an electrode, and then assembled and processed with protective screen and other components. What’s more, the corresponding film coating can be added in the plating process to realize the function of anti-reflection and anti-reflection of flat panel display products.

Solar Energy Industry

Sputtering target materials commonly used in preparing solar cell include aluminum target, copper target, molybdenum target, chrome target, ITO target and AZO target, etc. and their purity is generally over 99.99%. Usually, aluminum target and copper target are used for conducting layer film, molybdenum target and chrome target for blocking layer film, ITO target and AZO target for transparent conductive layer film.

In recent years, the cumulative installed capacity of solar PV in the world has been growing rapidly. In the next few years, the global solar cell industry is still in the rising stage, the market will be further globalized, and the scope and proportion of emerging markets will be expanded.

Keywords: molybdenum target,ITO target

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