Desktop Ultrafast Thermal Pressing Furnace RTP-M1 Description
Desktop Ultrafast Thermal Pressing Furnace is a desktop Ultrafast Thermal Pressing Furnace (UFTP) featuring a remarkable heating speed of over 200°C per minute and a maximum heating rate of up to 2900°C. This furnace is designed to operate under a selectable deadweight and controlled atmosphere, offering versatility in material processing.
Cost-effective and efficient, the RTP-M1 serves as an invaluable tool for studying material properties under fast, over-heated conditions. Additionally, it can be utilized as an RTP annealing furnace or easily modified into a CSS (Continuous Synthesis System) film coater, expanding its capabilities for various research and production applications.
Desktop Ultrafast Thermal Pressing Furnace RTP-M1 Specifications
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Features
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- 6" Quartz tube and SS flange as atmosphere control chamber with a vacuum level of 5x10-5 torr.
- Two tungsten foil or graphite foil disks as the heating element can reach 2900°C max. rapidly under low voltage and high current.
- The gap between the two foils is adjustable for various sample thickness
- The vacuum-sealed deadweight can be applied to the sample for hot pressing.
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Working Temperature
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- Max. heating temperature: 2900℃ (≤30s)
- Heating rate: ≤200℃
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Power
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220V AC, 19 KW, 50/60 Hz
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Temperature Control
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- Digital IR temperature sensor
- Heating modes:
(1) Manual heating with IR temperature display to achieve max heating rate ( ~ 200℃/S)
(2) Programmable temperature control by IR sensor and digital display
- Digital temperature controller
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Vacuum Chamber
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- High Purity quartz with dimensions:
O.D.: φ216mm, I.D.: φ206mm, Length: 300mm
- SS flanges are built-in on the top and bottom with gas inlet and outlet valve and KF 40 port for vacuum pump
- Vacuum level: 10-2 torr by mechanical pump and 10-5 by turbopump
- The digital vacuum gauge is included.
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Warranty
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- One year limited warranty with lifetime support.
- ATTENTION: Any damages caused by the use of corrosive and acidic gasses are not under the coverage of SAM One Year Limited Warranty.
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Weight
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Equipment Dimensions
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700mm L*600mm W* 1850mm H
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Certificate
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- CE Certified
- NRTL or CSA certification is available at extra cost.
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Desktop Ultrafast Thermal Pressing Furnace RTP-M1 Applications
- Materials Research: These furnaces are used to investigate the properties of materials under extreme conditions such as high temperature and pressure. Researchers can study phase transitions, material behavior, and the synthesis of novel materials.
- Nanotechnology: In the field of nanotechnology, these furnaces are utilized for the synthesis and processing of nanomaterials such as nanoparticles, nanowires, and thin films. The precise control over temperature and pressure enables the production of high-quality nanostructures.
- Semiconductor Industry: Ultrafast thermal pressing furnaces are employed in the semiconductor industry for processes such as wafer bonding, die attach, and package sealing. These processes require precise control over temperature and pressure to ensure proper bonding and reliability of electronic components.
Desktop Ultrafast Thermal Pressing Furnace RTP-M1 Packaging
Our Desktop Ultrafast Thermal Pressing Furnace RTP-M1 is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
