950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 Description
950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 is a state-of-the-art rapid thermal processing (RTP) furnace specifically designed for Close Spaced Sublimation (CSS) film coating on wafers up to 12 inches in diameter. This furnace can reach a maximum working temperature of 950°C and features dual groups of halogen heaters (top and bottom) that can independently achieve a rapid heating rate of up to 20°C per second. The top sample holder is rotatable, facilitating uniform film coating at speeds ranging from 1 to 10 RPM.
This furnace is particularly effective for the development of next-generation thin films for solar cells, including materials such as Cadmium Telluride (CdTe), Sulfide, and Perovskite. It is also suitable for annealing 12-inch semiconductor wafers.
950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 Specifications
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Features
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- A 20-inch ID vacuum chamber constructed from stainless steel, which achieves a vacuum level down to 10^-5 torr using a turbopump.
- Two 12-inch infrared (IR) heating plates strategically positioned within the chamber to optimize heat distribution.
- A Eurotherm precision temperature controller that ensures temperature accuracy to within ±0.1°C.
- A touchscreen computer that allows for comprehensive control over all processing parameters.
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Basic Parameters
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- Max. Heating Temp.: 950℃
- Max. Temperature difference between the two heaters: ≤ 300℃
- Max. Heating rate: 8℃/s
- Max. Cooling Rate: <20℃/s
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Power
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208 - 240VAC, three phases, 50/60 Hz
60kw
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Vacuum Chamber
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- Chamber dimension: ID 500mm x H 460mm
- Two 60mm dia quartz windows are built for easy observation.
- One air-tight sliding baffle is built-in for blocking the evaporation source under high vacuum
- A precision anti-corrosion digital vacuum gauge comes standard with the unit, ensuring accurate vacuum measurements.
- Optional Vacuum Pump: 10-5 torr by turbopump or 10-2 torr by a mechanical pump
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Heater and Sample Holder
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- Two IR heaters are located on top and bottom of the chamber with adjustable gaps from 2 - 25 mm.
- Heaters are made of stainless steel with a water cold jacket to keep heat insulation.
- 12 " Dia. the circular wafer holder is built into the top heater for holding the substrate.
- The graphite plates are placed on the top of the IR heater to make heating more uniform.
- The top sample holder is rotatable at an adjustable speed from 1 - 10 RPM
- A 58L/min circulating water chiller is included for cooling heaters
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Control System
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- Two Eurotherm 3000 digital temperature controllers with 24 segments programmable offer independent controlling of top and bottom heaters with +/- 0.1ºC accuracy
- All operations, such as temperature profiles, vacuum pressure, rotation speed, rotation speed and lifting of the flange are controlled by a touch screen computer via a PLC.
- The computer can show the temperature and vacuum profiles and star 10 pre-set programs of processing
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Net Weight
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~500 kg
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Dimension
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L 1450 X W 1250 X H 2100 mm
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Warranty
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- One year limited warranty with lifetime support.
- ATTENTION: Any damages caused by the use of corrosive and acidic gasses are not under the coverage of SAM One Year Limited Warranty.
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Certificate
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- CE Certified
- NRTL or CSA certification is available at extra cost.
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950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 Applications
950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 is particularly effective for the development of next-generation thin films for solar cells, including materials such as Cadmium Telluride (CdTe), Sulfide, and Perovskite. It is also suitable for annealing 12-inch semiconductor wafers.
950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 Packaging
Our 950C CSS and RTP Furnace OTF-1200X-RTP-II-CSS-300 is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
