1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S Description
1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S is a versatile 5-inch sliding furnace equipped with resistance heating and an electric sliding motor for efficient rapid heating and cooling. It efficiently achieves maximum heating and cooling rates of 2°C and 4°C per second, respectively, and is capable of annealing wafers up to 4 inches in diameter at temperatures as high as 1200°C. The unit is enclosed in a double-layer steel casing with air cooling to ensure the furnace shell temperature remains at or below 60°C.
1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S Specifications
|
Furnace Structure
|
- Double-Layer Steel Casing with Air Cooling: ≤60℃
- Separated Temperature Control Unit for Remote Operation
- Extended Heating Zone
- Dynamic Sliding Rails: which allow the furnace to move horizontally from one side to the other
- Annealing wafer up to 4" diameter max. with quartz boat
- Quartz tube: 5" quartz tube (130mm O.D x 120mm I.D x 1100mmL) is included with airtight flanges
|
|
Power
|
3KW, 208-240VAC, Single Phase, 50/60Hz
|
|
Working Temp.
|
- Max. Temp: 1200℃(<30min); 1100℃ continuous
- Heating Rate: ≤20℃/min
|
|
Sliding Control
|
- Dual sliding rails made of Cr plated steel
- Sliding rail length: 1200 m
- Sliding Range: 450mm
- Optional: Automatic sliding is driven by DC motor. is controlled by the temperature controller. When the heating program is finished, the furnace will slide from right to left at the set speed. Air fans will blow the heated areas to achieve fast cooling.
|
|
Temperature Controller
|
- Two PID automatic controllers with 30 programmable segments for control of heating & cooling rate, and dwell time.
- Built-in overheating & thermocouple broken protection.
- +/- 1℃ temperature accuracy.
- RS485 Communications Port.
- PC Control
|
|
Vacuum Controller
|
Limited by a vacuum pump
- 10^-2 torr can be achieved by a mechanical pump
- 10^-5 torr can be reached by a molecular pump
|
|
Net Weight
|
110kg
|
|
Dimension
|
1300x 550 x 600 mm (furnace close)
1300x 750 x 850 mm (furnace open)
350x 250 x 410 mm (control box)
|
|
Warranty
|
- Tube furnaces with quartz tubes are designed for use under vacuum and low pressure < 0.12 MPa
- Attention: A two-stage pressure regulator must be installed on the gas cylinder to limit the pressure to below 3 PSI for safe operation.
- Vacuum pressures may only be safely used up to 1000°C
|
|
Certificate
|
- CE Certified
- NRTL or CSA certification is available at extra cost.
|
1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S Applications
- Semiconductor Processing: One of the primary uses of RTP furnaces is in the semiconductor industry, where they are used for annealing semiconductor wafers.
- Material Synthesis and Experimentation: These furnaces are ideal for the synthesis of new materials, including metals, ceramics, and composites, especially when the process requires precise temperature control and rapid heating and cooling cycles.
- Coatings: RTP is used to deposit various types of coatings on substrates, including thin films and multi-layer coatings, which are essential in the production of electronic and optical devices.
- Research and Development: RTP furnaces are used extensively in scientific research to study the effects of high temperatures on different materials and the kinetics of phase transformations.
1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S Packaging
Our 1200C Sliding Tube Furnace for Rapidly Thermal Processing OTF-1200X-RTP-5S is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
