MG2274 Magnesium Oxide Wafers Substrates

Catalog No. MG2274
Material MgO
Clear Aperture >95 %
Thickness/Diameter Tolerance ±0.05 mm
Growth Method Special Arc Melting

SAM provides Magnesium Oxide Wafer Substrate in diameter from 2" to 12", we always choose prime grade and defect-free wafer as a substrate for growing high uniformity thermal oxide layer to meet your specific requirements.

Related Products: Indium Antimonide Wafer, Silicon Carbide Wafer, Gallium Phosphide Wafer, Silicon Wafer, 1851 Germanium Wafer.

Description of Magnesium Oxide Wafers Substrates

MgO wafer can be fabricated in round or square shape, with a SEMI flat or without flat, one side polished or two sides polished, size from 2" to 12", thickness range from 0.4, 0.5, 1 to 2 mm, surface are epi polished with low surface roughness. We have twin-free and defect-free MgO substrate with various orientations <100>, <110> and <111>, and high precision surface finish, please contact us for more product information.



Specifications of Magnesium Oxide Wafers Substrates




<100> / <111> / <110> or others





Surface quality


Wavefront Distortion

λ/4@632 nm

Surface flatness

λ/8@632 nm

Clear Aperture

>95 %



Thickness/Diameter Tolerance

±0.05 mm

Maximum dimensions

dia 50×100 mm


Applications of Magnesium Oxide Wafers Substrates

MgO Single Crystal Substrate products are used widely for HTSC (high-temperature superconductor) thin film coatings applications worldwide. There is also a growing amount of interest in using these substrates, because of their economic cost, for other applications that previously would not have justified the higher cost of MgO, such as for use as substrates for the III to V elements.


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