CY3454 Ni Coated SiO2/Si Substrate

Catalog No. CY3454
Compositions Ni, SiO2, Si
Purity >99.99%
Size 4”, 10x10x0.5 mm, or customized
Surface finish One side polished
Orientation <100> ±0.5°

Ni Coated SiO2/Si Substrate can be used in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Optical Products.

Related products: Ti coated SiO2/Si Substrate, Cu Coated SiO2/Si Substrate, Gold-plated Silicon Wafer, Pt-plated Silicon Wafer, Ag-plated Silicon Wafer

Ni Coated SiO2/Si Substrate Description

Ni Coated Ta/SiO2 Silicon Wafer can be used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers. The silicon wafer of this product is generally plated with a layer of Cu with a thickness of 100nm.

 

Ni Coated SiO2/Si Substrate Specifications

Nickel Film Thickness

100nm

Film Crystallinity

<111> - oriented polycrystals

Size

4" diameter +/- 0.5 mm, or customized

0.525 +/- 0.025 mm th

Surface finish

One side polished

Conductive type

Si P- type, B-doped

SiO2 Thickness

300 nm

Resistivity

1-20 ohm-cm

Orientation

<100> ±0.5°

Ni Coated SiO2/Si Substrate Applications

Widely used as substrates in the nano field, scanning electron microscopy (SEM), atomic force microscopy (AFM), and other scanning probe microscope ranging, as well as cell culture, protein DNA microarrays, and reflectometers.

Ni Coated SiO2/Si Substrate Packaging

Our Ni Coated SiO2/Si Substrate is carefully handled during storage and transportation to preserve the quality of our product in its original condition.

Packing: in 1000 class clean room with a plastic bag

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