Niobium Boride Evaporation Materials Description
Niobium Silicide (NbSi2) Evaporation Materials are widely recognized for their exceptional properties, making them integral to various thin film deposition applications. These materials are particularly valued in the semiconductor industry for the fabrication of metal silicide films, which play crucial roles in CMOS (Complementary Metal-Oxide-Semiconductor) devices and other integrated circuits. NbSi2 thin films exhibit excellent electrical conductivity, thermal stability, and chemical inertness, making them ideal choices for metal contacts, resistor layers, and conductors. Moreover, their remarkable oxidation resistance and high-temperature stability render them favorable for applications in solar cells, thermoelectric devices, and other high-temperature environments. As a result, NbSi2 Evaporation Materials are pivotal in advancing technologies across semiconductor manufacturing, electronics, and renewable energy sectors.
Niobium Boride Evaporation Materials Specification
CAS Number
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12045-19-1
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Chemical Formula
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NbB
|
Molecular Weight
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103.72
|
Form
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Gray crystalline powder
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Density
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6.97 g/cm3
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Melting Point
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2270℃
|
Exact Mass
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103.916
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Niobium Boride Evaporation Materials Application
Niobium Boride Evaporation Materials are widely used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry-leading evaporation materials.
Niobium Boride Evaporation Materials Packaging
Our Niobium Boride Evaporation Materials are carefully handled during storage and transportation to preserve the quality of our product in its original condition.