Dysprosium (Dy) Sputtering Target Description
Dysprosium (Dy) Sputtering Target is manufactured with outstanding purity (≥99%) to meet the rigorous demands of thin film deposition and surface coating applications. Designed for precision and reliability, this product offers excellent performance for applications in semiconductor manufacturing, optical coatings, and advanced research. Its customizable shapes, available as standard discs or tailored designs, ensure compatibility with diverse sputtering systems. The use of DC sputtering technology guarantees uniform deposition, making this target an ideal choice for industries requiring consistent and high-quality films.
Dysprosium (Dy) Sputtering Target Specification
Parameter
|
Value
|
Material
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Dysprosium
|
Purity
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≥99%, or customized
|
Color/Appearance
|
Silvery Metallic
|
Melting Point
|
1412℃
|
Density
|
8.54 g/cm³
|
Sputter
|
DC
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Type of Bond
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Indium, Elastomer
|
Available Sizes
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Dia.: 2″, 3″, 4″, or customized
|
Dysprosium (Dy) Sputtering Target Applications
· Semiconductor Manufacturing: Utilized for depositing high-quality thin films in microelectronics and integrated circuits.
· Optical Coatings: Ideal for enhancing reflective and transmissive properties in optical devices.
· Display Technologies: Applied in plasma display panels and similar advanced display systems.
· Solar Cells: Contributes to the development of efficient, high-performance photovoltaic layers.
· Research & Development: Perfect for experimental setups and specialized sputtering processes in material science.
Dysprosium Sputtering Target Packing
Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.
Manufacturing Process
Manufacturing Process

Elemental Analysis Methods
- Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).
- Gas Element Analysis: Conducted using LECO analysis
Frequently Asked Questions
Q: What applications are best suited for the Dysprosium (Dy) Sputtering Target?
A: The target is ideal for semiconductor manufacturing, optical coatings, display technologies, solar cells, and various research applications in material science.
Q: How is the high purity (≥99%) of the target ensured?
A: Our production process adheres to strict quality control standards, utilizing advanced purification technologies to consistently achieve and maintain high purity levels.
Q: Are custom shapes available for the Dysprosium (Dy) Sputtering Target?
A: Yes, we offer custom-made options to suit specific design and application requirements beyond the standard disc shape.
Q: What type of sputtering process is used with this target?
A: The Dysprosium target is optimized for DC sputtering, ensuring stable plasma and uniform thin film deposition.
Q: How should the Dysprosium (Dy) Sputtering Target be stored to maintain its quality?
A: The target should be stored in a clean, dry environment and handled carefully according to our packaging instructions to prevent contamination and damage.