Europium (Eu) Sputtering Target Description
The Europium (Eu) Sputtering Target is engineered for high-precision sputtering applications, delivering outstanding performance and consistency. With a purity of ≥99% and custom-made shapes, this target is optimal for thin film deposition in microelectronics, display technology, and other critical industrial processes. Its excellent physical properties, including a melting point of 822℃ and a density of 5.24 g/cm³, ensure reliable operation under demanding conditions.
Europium (Eu) Sputtering Target Specification
Parameter
|
Value
|
Material
|
Europium
|
Purity
|
≥99%, or customized
|
Color/Appearance
|
Silvery Metallic
|
Melting Point
|
822℃
|
Density
|
5.24 g/cm³
|
Sputter
|
DC
|
Type of Bond
|
N/A
|
Available Sizes
|
Dia.: 2″, 3″, 4″, or customized
|
Europium (Eu) Sputtering Target Applications
· Thin Film Deposition: Essential for fabricating high-quality coatings in microelectronics and display screens.
· Optoelectronics: Used in the production of light-emitting devices and lasers.
· Microfabrication: Ideal for creating precise structures in semiconductor manufacturing.
· Scientific Research: Utilized in laboratories for the development of experimental materials and coatings.
· Custom Industrial Coatings: Suited for various applications requiring durable, high-performance thin films.
Europium Sputtering Target Packing
Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.
Packaging: Carton, Wooden Box, or Customized.
Specification
Parameter
|
Value
|
Material
|
Europium
|
Purity
|
≥99%, or customized
|
Color/Appearance
|
Silvery Metallic
|
Melting Point
|
822℃
|
Density
|
5.24 g/cm³
|
Sputter
|
DC
|
Type of Bond
|
N/A
|
Available Sizes
|
Dia.: 2″, 3″, 4″, or customized
|