ST0015 Gadolinium (Gd) Sputtering Target

Gadolinium (Gd) Sputtering Target Description

Gadolinium (Gd) Sputtering Target is engineered for advanced industrial applications, offering exceptional performance in thin-film deposition processes. Manufactured with high-purity Gd (≥99%), the target is available in standard disc shapes or can be custom-made to client specifications. With a melting point of 1312℃ and a density of 7.9 g/cm³, it is optimized for DC sputtering, making it ideal for electronic, optical, and research applications. Its consistent quality and reliability make it a preferred choice for producing high-performance coatings and microelectronic components.

Gadolinium (Gd) Sputtering Target Specification

Gadolinium (Gd) Sputtering Target Applications

· Electronics: Ideal for microelectronic and integrated circuit fabrication where material stability is critical.
· Display Technology: Used in the manufacturing of advanced display coatings and optical filters.
· Research and Development: Perfect for experimental thin-film deposition and materials research.
· Surface Coatings: Suitable for applications requiring precision and uniformity in sputter deposition.
· Specialized Industrial Processes: Applicable in high-performance industrial sputtering for sensors and novel devices.

Gadolinium Sputtering Target Packing

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

Manufacturing Process

Manufacturing Process

Elemental Analysis Methods

• Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).
• Gas Element Analysis: Conducted using LECO analysis

Frequently Asked Questions

Q: What is the purity level of the Gadolinium Sputtering Target?
A: The target is manufactured with a purity level of ≥99%.

Q: Which sputtering method is recommended for using this target?
A: This target is designed primarily for DC sputtering applications.

Q: Is the target available in different shapes or sizes?
A: Yes, it is available in standard disc shapes and can also be custom-made according to specific client requirements.

Q: What is the melting point of the target and why is it significant?
A: The melting point is 1312℃, ensuring the material remains stable under high-temperature sputtering processes.

Q: How is the Gadolinium Sputtering Target packaged for shipment?
A: It is vacuum-sealed and packaged securely, with options for customized packaging to meet specific delivery needs.