Lanthanum (La) Sputtering Target Description
Lanthanum (La) Sputtering Target is crafted from high-purity lanthanum (≥99%), offering exceptional quality and performance for modern sputtering applications. Manufactured with precision, it is designed to provide consistent, uniform deposition and is ideal for advanced coating techniques used in semiconductor, electronic, and optical industries. Its tailored properties ensure that users experience optimal efficiency, making it a reliable choice for demanding industrial environments.
Lanthanum (La) Sputtering Target Specification
Parameter
|
Value
|
Material
|
Lanthanum
|
Purity
|
≥99%, 99.9%, or customized
|
Color/Appearance
|
Silvery Metallic
|
Melting Point
|
927℃
|
Density
|
7.3 g/cm³
|
Sputter
|
RF
|
Type of Bond
|
N/A
|
Available Sizes
|
Dia.: 2″, 3″, 4″, or customized
|
Lanthanum (La) Sputtering Target Applications
· Thin Film Deposition: Widely used in semiconductor manufacturing and optical coating processes.
· Vacuum Coating: Essential for creating uniform thin films in electronics and sensor applications.
· Advanced Electronics: Suitable for high-fidelity deposition in electronic displays and integrated circuits.
· Research and Development: Utilized in laboratories for material science research and prototype development.
Lanthanum Sputtering Target Packing
Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.
Manufacturing Process
Manufacturing Process

Elemental Analysis Methods
· Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).
· Gas Element Analysis: Conducted using LECO analysis
Frequently Asked Questions
Q: What makes the Lanthanum (La) Sputtering Target ideal for RF sputtering?
A: Its high purity (≥99%) and optimized material properties ensure efficient and uniform deposition in RF sputtering applications.
Q: Can the shapes of the sputtering targets be customized?
A: Yes, the targets can be manufactured as discs or in custom-made shapes to suit your specific application requirements.
Q: What industries benefit most from using this Lanthanum (La) Sputtering Target?
A: Industries such as semiconductor manufacturing, advanced electronics, optical coatings, and research and development benefit from its high-performance characteristics.
Q: How does the purity of the material impact its performance?
A: High purity (≥99%) minimizes impurities, ensuring consistent deposition, improved film uniformity, and enhanced overall performance in critical applications.
Q: Is there support available for selecting the right size and configuration for my application?
A: Yes, our expert team is available to assist in selecting the appropriate target size and configuration to meet your specific manufacturing needs.