ST0027 Lutetium (Lu) Sputtering Target

Lutetium (Lu) Sputtering Target Description

Lutetium (Lu) Sputtering Target is engineered using advanced manufacturing processes to ensure superior purity and consistent performance. Its unique characteristics, including a high melting point and precise material composition, make it perfectly suited for sputtering applications in various high-tech industries. This target is essential for depositing uniform thin films on substrates, enhancing the performance and durability of electronic displays, solar cells, and optical coatings. With customizable sizes available, our product is designed to meet specialized industry requirements and foster innovation in research and development.

Lutetium (Lu) Sputtering Target Specification

Lutetium (Lu) Sputtering Target Applications

· Thin Film Deposition: Ideal for producing high-quality coatings on electronic, optical, and photovoltaic devices.
· Microelectronics: Used in the fabrication of advanced integrated circuits and semiconductor devices.
· Surface Engineering: Provides uniform film deposition for wear resistance and improved material properties.
· Research and Development: Serves as a critical material in experimental studies for novel applications in sputtering technology.

Lutetium Sputtering Target Packing

Our products are packaged in customized cartons of various sizes based on the material dimensions. Small items are securely packed in PP boxes, while larger items are placed in custom wooden crates. We ensure strict adherence to packaging customization and the use of appropriate cushioning materials to provide optimal protection during transportation.

Packaging: Carton, Wooden Box, or Customized.

Manufacturing Process

Manufacturing Process

Elemental Analysis Methods

·        Metal Element Analysis: Conducted using ICP-OES (Inductively Coupled Plasma Optical Emission Spectrometry).

·        Gas Element Analysis: Conducted using LECO analysis

Frequently Asked Questions

Q: What industries benefit from using Lutetium (Lu) Sputtering Targets?
A: They are widely used in the electronics, optics, microelectronics, and materials research industries for high-quality thin film deposition.

Q: How does the high purity (≥99%) of the target impact its performance?
A: High purity ensures consistent sputtering performance, minimizes contamination, and enhances the quality and uniformity of thin film coatings.

Q: Can the available sizes be customized for specific applications?
A: Yes, the sizes of the sputtering targets are fully customizable to meet the unique requirements of different industrial applications.

Q: What is the significance of the target's bonding type?
A: The use of Indium and Elastomer as bonding agents helps secure the target material during operation, ensuring stability and longevity in high-temperature sputtering processes.

Q: How is the Lutetium (Lu) Sputtering Target integrated into the sputtering system?
A: It is designed to be compatible with standard sputtering systems, allowing for seamless integration into deposition processes for enhanced thin film applications.