ST0104 Nickel Manganese (Ni/Mn) Sputtering Target

Nickel Manganese (Ni/Mn) Sputtering Target Description

Nickel Manganese (Ni/Mn) Sputtering Target is a precision-engineered product used in the deposition of high-quality thin films. Manufactured to meet a purity of ≥99%, this sputtering target is available in disc form or can be custom-made to suit specialized applications. Its unique composition of nickel and manganese provides advantageous physical and chemical properties, making it suitable for a variety of advanced industrial processes. Leveraging state-of-the-art production techniques, Stanford Advanced Materials ensures consistent performance and reliability for demanding applications.

Nickel Manganese (Ni/Mn) Sputtering Target Applications

· Semiconductor Fabrication: Utilized in the production of integrated circuits and microelectronic devices.
· Optical Coatings: Applied for depositing films that enhance optical performance in lenses and mirrors.
· Display Technologies: Used in the formation of conductive and protective layers in display panels.
· Industrial Coatings: Ideal for applications requiring durable, corrosion-resistant thin films across various sectors.

Nickel Manganese (Ni/Mn) Sputtering Target Packing

Our Nickel Manganese (Ni/Mn) Sputtering Targets are packaged under strict quality control measures to ensure preservation of their properties during transit. Products are vacuum-sealed and securely packed to maintain integrity and performance, with each unit clearly marked for traceability.

Frequently Asked Questions

Q: What industries commonly use the Nickel Manganese (Ni/Mn) Sputtering Target?
A: It is widely used in semiconductor fabrication, optical coating applications, display technology, and various industrial coating processes.

Q: Can the target shapes be customized according to specific requirements?
A: Yes, the Nickel Manganese (Ni/Mn) Sputtering Target is available in standard disc form and can also be custom-made to meet specialized application needs.

Q: How does the Ni/Mn composition benefit thin film deposition?
A: The Ni/Mn composition offers unique physical and chemical properties that enhance film adhesion, durability, and overall performance during the sputtering process.

Q: What purity level is ensured for this product?
A: The product is manufactured to a purity level of ≥99%, ensuring high performance and consistency in demanding applications.

Q: How is the product packaged to ensure quality during shipping?
A: The targets are vacuum-sealed and securely packed to preserve their quality and properties, making them reliable upon arrival for sensitive industrial processes.