ST0114 Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target

Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target Description

The Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target is engineered for high-performance sputter deposition processes, delivering superior and consistent film qualities. Manufactured with precision and attention to detail, it offers a customizable design tailored to specific application requirements while maintaining an excellent purity standard of ≥99%. This product is ideal for enhancing the performance of electronic devices, display technologies, and optical coatings through reliable and high-quality thin film deposition.

Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target Applications

· Electronics: Ideal for the deposition of thin films in displays, semiconductors, and other electronic components.
· Surface Coatings: Provides an exceptional foundation for protective coatings, ensuring durability and resistance.
· Sensors: Utilized in the fabrication of high sensitivity sensors in industrial and research applications.
· Energy Devices: Applicable in the manufacturing of solar cells, LED modules, and other energy-related devices.

Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target Packing

Our Titanium Aluminum Vanadium Sputtering Target is provided in specially designed packaging to maintain product integrity during storage and transportation. The targets are securely packaged based on custom requirements, ensuring compatibility with various sputtering system configurations.

Frequently Asked Questions

Q: What is a sputtering target?
A: A sputtering target is a specialized material used as a source for thin film deposition. During the sputtering process, energetic particles bombard the target material, causing atoms to be ejected and deposited onto a substrate.

Q: What does "custom-made shapes" mean in the context of sputtering targets?
A: It means that the targets can be manufactured in various specific geometries and sizes based on customer requirements, ensuring optimal performance for the intended application.

Q: How does the Ti/Al/V composition benefit sputtering applications?
A: The Ti/Al/V composition offers high purity and tailored material properties that improve thin film uniformity and performance, making it well-suited for precision applications in electronics and coatings.

Q: Why is a purity level of ≥99% important?
A: A high purity level minimizes contaminants and impurities during deposition, leading to improved film quality, enhanced conductivity, and better overall performance of the final product.

Q: Are there special storage instructions for this sputtering target?
A: Yes, it is recommended to store the sputtering targets in a cool, dry environment, and keep them in their sealed packaging to maintain their high-performance qualities until use.