Nickel Silicide Evaporation Materials Description
Nickel Silicide (NiSi2) Evaporation Material is a silicide ceramic evaporation material. High-purity NiSi2 evaporation materials play a huge role in deposition processes to ensure high-quality deposited film.
Nickel Silicide Evaporation Material, provided by Stanford Advanced Materials, is a silicide ceramic evaporation material with the chemical formula NiSi2. Hi gh-purity NiSi2 evaporation materials play a significant role in deposition processes, ensuring the creation of high-quality deposited films. Stanford Advanced Materials (SAM) excels in producing evaporation materials with purity levels reaching up to 99.9995%, utilizing rigorous quality assurance processes to ensure impeccable product reliability.
Nickel Silicide Evaporation Materials Specification
Material Type |
Nickel silicide |
Symbol |
NiSi2 |
Melting Point |
1,255 °C (2,291 °F; 1,528 K) |
Density |
7.40 g/cm3 |
Purity |
99.9% |
Shape |
Powder/ Granule/ Custom-made |
Nickel Silicide Evaporation Materials Application
Nickel Silicide Evaporation Materials find extensive applications in deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are predominantly used in optics, offering wear protection, decorative coatings, and contributing to display technologies.
Nickel Silicide Evaporation Materials Packaging
To ensure streamlined identification and quality control, Nickel Silicide Evaporation Materials are meticulously tagged and externally labeled. We exercise utmost care to prevent any potential damage that might occur during storage or transportation.