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ST0191 Tantalum Oxide Sputtering Target, Ta2O5

Catalog No. ST0191
Chemical Formula Ta2O5
CAS Number 1314-61-0
Purity 99.9%, 99.95%, 99.99%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Tantalum Oxide Sputtering Target is a high-purity material widely used for thin-film deposition in optical coatings, semiconductors, and protective layers. Stanford Advanced Materials (SAM) offers high-quality Tantalum Oxide Sputtering Target with competitive pricing.

Related products: Fluorine Doped Tin Oxide FTO Sputtering Target, Cobalt Ferrite Sputtering Target, CoFe2O4

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Tantalum Oxide Sputtering Target, Ta2O5
Tantalum Oxide Sputtering Target, Ta2O5
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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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