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WM3862 Tungsten Diselenide CVD Film (WSe2)

Catalog No. WM3862
Type Single crystal grains
Substrate Material SiO2/Si, silicon wafer, PET, PI, ITO, FTO, glass.
Size 10*10, 15*15, 20*20 mm, or customized
Method Chemical Vapor Deposition (CVD)

We provide Tungsten Diselenide CVD Films on various substrates, such as: SiO2/Si, silicon wafer, PET, PI, ITO, FTO, glass. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Tungsten Diselenide CVD Film.

Related products: Nickel Telluride CVD Film (NiTe2), Bismuth Selenide CVD Film (Bi2Se3), Tin Diselenide Saphire Film (SnSe2)

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Tungsten Diselenide CVD Film
Tungsten Diselenide CVD Film
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