Zirconium Aluminum (Zr/Al) Evaporation Materials Description
Zirconium aluminum evaporation material from Stanford Advanced Materials is an alloy evaporation material containing Zr and Al. High-purity zirconium aluminum evaporation materials play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity evaporating materials using quality assurance processes to guarantee product reliability.
Zirconium Aluminum (Zr/Al) Evaporation Materials Specifications
Property |
Value |
Composition |
Zr/Al |
Purity |
99.9% |
Melting Point |
Zirconium: 1,852°C, Aluminum: 660.32°C |
Density |
Zirconium: 6.49 g/cm³, Aluminum: 2.70 g/cm³ |
Thermal Conductivity |
Zirconium: 22 W/m·K, Aluminum: 237 W/m·K |
Coefficient of Expansion |
Zirconium: 5.8 × 10⁻⁶/K, Aluminum: 22.24 × 10⁻⁶/K |
Zirconium Aluminum (Zr/Al) Evaporation Materials Application
Zirconium aluminum evaporation materials are used in the following applications:
• Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD)
• Used for optics including wear protection, decorative coatings, and displays.
Zirconium Aluminum (Zr/Al) Evaporation Materials Packaging
Zirconium aluminum evaporation materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.