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Stanford Advanced Materials
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Stanford Advanced Materials

Sputtering Targets

Sputtering targets are available monoblock or bonded with dimensions and configurations up to 820 mm, and are produced with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices and the latest processing equipment, such as large area coating and flip-chip applications. Research-sized targets are also available, as are custom sizes and alloy compositions.

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