GR0976 Silicon Carbide Coated Graphite Trays

Silicon Carbide Coated Graphite Trays Description:

CVD process delivers extremely high purity and theoretical density of SiC coating with no porosity. What’s more, as silicon carbide is very hard, it can be polished to a mirror-like surface. CVD silicon carbide (SiC) coating delivered several advantages including ultra-high purity surface and extremely wear durability. As the coated products have great performance in high vacuum and high-temperature circumstances, they are ideal for applications in the semiconductor industry and other ultra-clean environments.

Stanford Advanced Materials also provides pyrolytic graphite (PG) products.

Silicon Carbide Coated Graphite Trays Applications:

• CVD silicon carbide coating has been applied in semiconductor industries already, such as MOCVD tray, RTP, and oxide etching chamber since silicon nitride has great thermal shock resistance and can withstand high energy plasma.
• Silicon carbide is widely used in semiconductors and coating.