Niobium Hafnium Alloy Targets Description
Niobium hafnium alloy has an excessive melting point, first-rate anti-corrosion and workability. Niobium hafnium alloy may be used for pharmacy, semiconductor, aviation, nuclear, and so forth.High purity sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.95% purity Niobium Hafnium Alloy Targets using quality assurance processes to guarantee product reliability.
Niobium Hafnium Alloy Targets Specification
Surface
|
Polished
|
Size
|
Circular Targets Diameter 10-400 mm Thickness 2-28
|
Material
|
R04295 (Nb-10Hf) Nb-10W-10Hf (Niobium 10%Tungsten
|
Purity
|
99.9% 99.95% 99.99%
|
Niobium Hafnium Alloy Targets Application
1. Semiconductor Manufacturing: Used as sputtering targets in the production of semiconductor devices such as integrated circuits (ICs), transistors, and diodes.
2. Data Storage: Employed in the fabrication of magnetic recording media, such as hard disk drives (HDDs) and magnetic tape, for high-density data storage applications.
3. Optical Coatings: Applied in the deposition of thin films for optical components, lenses, mirrors, and filters used in lasers, optical instruments, and telecommunications devices.
4. Solar Cells: Utilized in the production of thin-film solar cells for photovoltaic applications due to their excellent conductivity and stability.
Niobium Hafnium Alloy Targets Packaging
Our Niobium Hafnium Alloy Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
FAQs
Q1: How are Niobium Hafnium Alloy Targets / Discs manufactured?
A1: Niobium Hafnium Alloy Targets and Discs are produced through the following process:
Vacuum arc melting (VAM) or electron-beam melting (EBM): These processes are used to create an alloy of niobium and hafnium in a controlled environment, ensuring a uniform composition.
Machining: The alloy is then machined into discs or targets with precise dimensions and a smooth surface finish.
Polishing and cleaning: After machining, the discs or targets are polished and cleaned to remove any impurities and prepare them for use in sputtering applications.
Q2: What industries use Niobium Hafnium Alloy Targets / Discs?
A2: Niobium Hafnium Alloy Targets and Discs are used in a wide variety of industries, including:
Semiconductors: For thin-film deposition in the production of integrated circuits, photonics, and microelectronics.
Aerospace: For high-temperature coatings and applications in turbine blades, jet engines, and space exploration equipment.
Nuclear: In reactors and fuel assemblies, where materials must withstand high radiation levels and extreme temperatures.
Defense: For military technology requiring durable, high-performance coatings and parts.
Optics: In the production of thin-film coatings for lenses, mirrors, and optical devices.
Energy: For power generation systems, including coatings for turbine blades and other high-performance components.
Q3: How should Niobium Hafnium Alloy Targets / Discs be handled and stored?
A3: Handling: Handle with care to avoid surface contamination or damage. Always use gloves to avoid transferring oils or dirt to the surface, which could affect the sputtering process.
Storage: Store Niobium Hafnium Alloy Targets and Discs in a clean, dry, and cool environment to prevent oxidation or contamination. They should be kept in protective packaging to prevent scratches or damage.
Avoid moisture: Ensure that the storage area is free from excessive humidity, as moisture can cause oxidation over time.