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  • ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

    • ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

    Catalog No. ST0515
    Chemical Formula HfO2/Y2O3
    Purity 99.9%, 99.99%, 99.999%
    Shape Discs, Plates, Column Targets, Step Targets, Custom-made

    SAM’s Hafnium Oxide with Yttrium Oxide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

     

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    sc/1707026673-normal-hafnium-oxide-with-yttrium-oxide-sputtering-target-hfo2y2o3.jpg
    sc/1707026673-normal-hafnium-oxide-with-yttrium-oxide-sputtering-target-hfo2y2o3.jpg
    Description
    Specification

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    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    Bonding

    Yes

    • Yes
    • No
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