Ion implantation is an important process that is widely used in semiconductor device fabrication, metal finishing and materials science research. The Ion Implantation Components are often made of TZM alloy, molybdenum, tungsten, because these materials could perform well in harsh environment.
• Used to manufacture semiconductors.
• Used in metal finishing for tool steel toughening and surface finishing.
• Used in ion beam mixing to achieve graded interface and strengthen adhesion between immiscible material.
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