ST0444 Lanthanum Ferrite Sputtering Target, LaFeO3

Lanthanum Ferrite Sputtering Target Description

Lanthanum Ferrite Sputtering Targets offer the following key features:

• High Purity: Available in 99.9%, 99.99%, and 99.999% purity levels to ensure minimal impurities and superior film quality.
• Various Shapes: Offered as discs, plates, column targets, step targets, and custom shapes to suit various sputtering equipment and processes.
• Size Flexibility: Available in diameters ranging from 1.0″ to 6.0″ and thicknesses of 0.125″ and 0.250″, with customization options available.
• Stable Composition: Maintains structural integrity during sputtering, resulting in durable and adherent coatings.
• Enhanced Deposition Efficiency: Optimized for consistent sputtering rates and efficient material usage.
• Compatibility: Suitable for multiple sputtering techniques, including DC and magnetron sputtering.

These targets are engineered to deliver reliable performance in demanding deposition environments, making them ideal for advanced thin-film applications.

Lanthanum Ferrite Sputtering Target Specification

Other sizes are also available. Please contact us for customized sputtering targets.

Lanthanum Ferrite Sputtering Target Application

Lanthanum Ferrite Sputtering Targets are integral to various advanced technologies and industries, including:

• Thin Film Deposition: Ensures high-quality and uniform thin films for diverse applications.
• Decoration: Enhances surface aesthetics and functionality.
• Semiconductors: Critical for fabricating semiconductor devices with precise material properties.
• Displays and LEDs: Used in the production of high-performance display panels and LED devices.
• Photovoltaic Devices: Contributes to efficient solar cell manufacturing.
• Functional Coatings: Provides durable and specialized coatings for different substrates.
• Optical Information Storage: Utilized in the creation of optical storage media.
• Glass Coating Industries: Applied in automotive and architectural glass coatings.
• Optical Communication: Facilitates advanced optical communication technologies.

Lanthanum Ferrite Sputtering Target Bonding Services

SAM offers comprehensive Target Bonding Services for Lanthanum Ferrite Sputtering Targets. Our expertise includes:

• Machining Standard Backing Plates: Precision machining to ensure optimal performance.
• Collaboration with Taiwan Bonding Company: Partnering with industry leaders to provide reliable and high-quality bonding solutions.

This service ensures that the sputtering targets are perfectly bonded to their backing materials, enhancing their durability and performance during deposition processes.

Lanthanum Ferrite Sputtering Target Packaging

Our Lanthanum Ferrite Sputter Targets are meticulously packaged to prevent any damage during storage and transportation. We employ robust packaging methods to maintain the integrity and quality of the targets, ensuring they reach you in pristine condition.

Frequently Asked Questions (FAQs)

1. How do I choose the appropriate purity level for the sputtering target?

The choice of target purity should be based on specific application requirements. For high-precision semiconductor and optoelectronic device manufacturing, it is recommended to use high-purity 99.999% targets to ensure thin film quality and performance.

2. How long does it take to customize a sputtering target?

The delivery time for customized sputtering targets depends on the specific specifications and quantity. Typically, standard sizes can be delivered within 2-4 weeks, while special specifications may require a longer timeframe. Please contact our sales team for detailed information.

3. What advantages do Lanthanum Ferrite Sputtering Targets have over other oxide targets?

Lanthanum Ferrite targets possess excellent electrical and magnetic properties, making them suitable for manufacturing high-performance electronic devices. Additionally, their stable chemical composition and high purity ensure consistency and reliability of the thin films.

4. How should I properly store and handle sputtering targets?

Targets should be stored in a dry and cool environment, avoiding moisture and high temperatures. When handling, appropriate protective equipment should be used to prevent scratching or contamination of the target surface.

5. What is the lifespan of a sputtering target?

The lifespan of a target depends on sputtering equipment parameters, process conditions, and usage frequency. High-purity and high-quality targets generally have a longer service life, reducing replacement frequency and costs.

6. Does this target material require a backing plate?

Yes, ceramic target materials require a backing plate because they are fragile and prone to moisture absorption. The backing plate enhances mechanical strength and stability, improving durability and performance during use.