ST1051 Tantalum Sputtering Target (Ta Sputtering Target)

Catalog No. ST1051
Material R05200; R05400
Standard ASTM B708-2001
Purity ≥99.95%, 99.99%9, 99.999%

Stanford Advanced Materials (SAM) provides high-quality Tantalum Sputtering Target. These tantalum targets are all made from high-quality Tantalum Disc.

Other tantalum products: tantalum foil / tantalum strip, tantalum sheet / tantalum plate, tantalum tube / tantalum pipe, tantalum wire, etc.

Tantalum Sputtering Target Description

Tantalum (Ta) is a dark blue-gray metal that is very heavy, ductile, and hard and has high corrosion resistance. Tantalum is especially resistant to chemicals at temperatures below 150 °C and can only be dissolved with hydrofluoric acid. It has the fourth-highest melting point of all metals and is able to form extremely thin and protective oxide layers for high-quality capacitors, making it an excellent material for sputtering targets.

ta planar target ta revolving target

Tantalum Sputtering Target Specifications

Part No.

Material

Size

Purity

TA0201

Tantalum

1.00" Dia. x 0.125" Thick

99.95%

TA0202

Tantalum

1.00" Dia. x 0.250" Thick

99.95%

TA0203

Tantalum

2.00" Dia. x 0.125" Thick

99.95%

TA0204

Tantalum

2.00" Dia. x 0.250" Thick

99.95%

TA0205

Tantalum

3.00" Dia. x 0.250" Thick

99.95%

TA0206

Tantalum

3.00" Dia. x 0.250" Thick

99.95%

TA0207

Tantalum

4.00" Dia. x 0.250" Thick

99.95%

TA0208

Tantalum

4.00" Dia. x 0.250" Thick

99.95%

TA0209

Tantalum

5.00" Dia. x 0.250" Thick

99.95%

TA0210

Tantalum

5.00" Dia. x 0.250" Thick

99.95%

Need a tailor-made solution? Contact us.

We also provide high-quality Tantalum Disc.

Other information for your reference
Chemical Composition:

Element

R05200 (%,Max)

R05400 (%,Max)

C

0.01

0.01

O

0.015

0.03

N

0.01

0.01

H

0.0015

0.0015

Fe

0.01

0.01

Mo

0.02

0.02

Nb

0.1

0.1

Ni

0.01

0.01

Si

0.005

0.005

Ti

0.01

0.01

W

0.05

0.05

Tantalum and Tantalum Alloy

Tantalum Sputtering Target Applications

• Used in laboratory equipment.
• Used as a substitute for platinum.
• Used in manufacturing superalloys and electron-beam melting.
• Used in metallurgical, machinery processing, glass, and ceramic industries.
• Used as a superalloy additive in nickel-based alloys.
• Used for sputtering targets in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD).

Tantalum Sputtering Target Packaging

Our tantalum sputtering targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Material Safety Data Sheet (MSDS) for your reference!

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