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Ion implantation is an important engineering process by which ions of a material are accelerated in an electrical field and impacted into a target. The process will change the physical, chemical, or electrical properties of the target, which is often used in semiconductor device fabrication, metal finishing and material s science research.
The heart of an implanter system is the beam path, where ions are generated, concentrated, accelerated and guided at high speed to the target. So the materials of beam path should withstand harsh conditions including high temperature, aggressive process gas and strong magnetic fields. Currently the beam path is made of TZM, molybdenum, tungsten, graphite, ceramics and steel.
Ion Implantation Components (TZM Alloy) for saleStanford Advanced Materials (SAM) provides ion implantation components made of various materials with competitive price.Related products: ion implantation components (Molybdenum), ion implantation components (Tungsten)
Stanford Advanced Materials (SAM) is a trusted supplier and manufacturer of ion implantation components used in the manufacture of semiconductors. We also supply a full range of heat-resistant products made from molybdenum and tungsten. Related products: Molybdenum Heat Shield, Molybdenum Spinning Nozzle, Molybdenum Heating Elements, Molybdenum Crucible,...
Ion Implantation Components (Tungsten) for saleStanford Advanced Materials (SAM) provides customized ion implantation components with high quality and competitive price.Related products: ion implantation components (Molybdenum), ion implantation components (TZM)