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ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

Catalog No. ST0515
Chemical Formula HfO2/Y2O3
Purity 99.9%, 99.99%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

SAM’s Hafnium Oxide with Yttrium Oxide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

 

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United States

    Purity

    99.9%

    • 99.9%
    • 99.5%
    • 99.99%
    • 99.999%
    • Other
    Diameter

    2''

    • 2''
    • 3''
    • 4''
    • 5''
    • 6''
    • Other
    Thickness

    0.25''

    • 0.25''
    • 0.125''
    • All
    • Other
    Bonding

    Yes

    • Yes
    • No
    • Other
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