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  • ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

    • ST0515 Hafnium Oxide with Yttrium Oxide Sputtering Target, HfO2/Y2O3

    Catalog No. ST0515
    Chemical Formula HfO2/Y2O3
    Purity 99.9%, 99.99%, 99.999%
    Shape Discs, Plates, Column Targets, Step Targets, Custom-made

    100% U.S. Domestic Supply Chain — from raw materials to finished product.
    Please indicate if you require materials that are fully China-free.

    SAM’s Hafnium Oxide with Yttrium Oxide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

     

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    hafnium-oxide-with-yttrium-oxide-sputtering-target-hfo2y2o3
    hafnium-oxide-with-yttrium-oxide-sputtering-target-hfo2y2o3
    Description
    Specification

    LATEST RECOMMENDED

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    GET A QUOTE

    Send us an inquiry today to learn more and receive the latest pricing. Thank you!

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      Purity

      99.9%

      • 99.9%
      • 99.5%
      • 99.99%
      • 99.999%
      • Other
      Diameter

      2''

      • 2''
      • 3''
      • 4''
      • 5''
      • 6''
      • Other
      Thickness

      0.25''

      • 0.25''
      • 0.125''
      • All
      • Other
      Bonding

      Yes

      • Yes
      • No
      • Other
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