|Type||Single crystal grains|
|Substrate Material||SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.|
|Size||10*10, 15*15, 20*20 mm|
|Method||Chemical Vapor Deposition (CVD)|
We provide Nickel Telluride CVD Films on various substrates, such as SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Nickel Telluride CVD Film.
SAM provide Nickel Telluride CVD Films on various substrate, such as: SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Optoelectronic devices, microelectronic devices, biological sensing, chemical sensing and other fields.
Our Nickel Telluride CVD Film (NiTe2) is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
NK4205 Nickel-Boron (NiB) Master Alloy
NK4206 Nickel-Calcium (Ni-Ca) Master Alloy
NK4207 Nickel-Hafnium (Ni-Hf) Master Alloy
NK4208 Nickel-Manganese (Ni-Mn) Master Alloy
NK4209 Nickel-Zirconium (Ni-Zr) Master Alloy
NK4211 Nickel Sulfide (NiS) Powder (CAS No. 16812-54-7)
NK4212 Nickel Silicon Alloy
NK4214 Nickel on Silica-alumina Catalyst
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