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NK3861 Nickel Telluride CVD Film (NiTe2)

Catalog No. NK3861
Type Single crystal grains
Substrate Material SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Size 10*10, 15*15, 20*20 mm
Method Chemical Vapor Deposition (CVD)

We provide Nickel Telluride CVD Films on various substrates, such as SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Nickel Telluride CVD Film.

Related products: Tungsten Diselenide CVD Film (WSe2), Bismuth Selenide CVD Film (Bi2Se3), Tin Diselenide Saphire Film (SnSe2)

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sc/1640314479-normal-Nickel Telluride CVD Film.jpg
sc/1640314479-normal-Nickel Telluride CVD Film.jpg
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