NK3861 Nickel Telluride CVD Film (NiTe2)

Catalog No. NK3861
Type Single crystal grains
Substrate Material SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.
Size 10*10, 15*15, 20*20 mm
Method Chemical Vapor Deposition (CVD)

We provide Nickel Telluride CVD Films on various substrates, such as SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Nickel Telluride CVD Film.

Related products: Tungsten Diselenide CVD Film (WSe2), Bismuth Selenide CVD Film (Bi2Se3), Tin Diselenide Saphire Film (SnSe2)

Nickel Telluride CVD Film (NiTe2) Description

SAM provide Nickel Telluride CVD Films on various substrate, such as: SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc.

Nickel Telluride CVD Film (NiTe2) Application

Optoelectronic devices, microelectronic devices, biological sensing, chemical sensing and other fields.

Nickel Telluride CVD Film (NiTe2) Packaging

Our Nickel Telluride CVD Film (NiTe2) is carefully handled during storage and transportation to preserve the quality of our product in its original condition.

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