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Tantalum Sputtering Target (Ta Sputtering Target) Maximize

Tantalum Sputtering Target (Ta Sputtering Target)

Catalog No.TA0200
MaterialR05200; R05400
StandardASTM B708-2001
Purity≥99.95%, 99.99%9, 99.999%

Leading manufacturer of tantalum products – SAM
Stanford Advanced Materials (SAM) provides high quality Tantalum Sputtering Target. These targets are all made from high quality Tantalum Disc.

Other tantalum products: tantalum foil / tantalum strip, tantalum sheet / tantalum plate, tantalum tube / tantalum pipe, tantalum wire, etc.

More details

Tantalum Sputtering Target Introduction:

Tantalum (Ta) is a dark blue-gray metal that is very heavy, ductile and hard and has high corrosion resistance. Tantalum is especially resistant to chemicals at temperatures below 150 °C and can only be dissolved with hydrofluouric acid. It has the fourth highest melting point of all metals and is able to form extremely thin and protective oxide layers for high-quality capacitors, making it an excellent material for sputtering target.

ta planar target ta revolving target

       Tantalum Planar Target                         Tantalum Revolving Target

Tantalum Sputtering Target Applications:

• Used in laboratory equipment.
• Used as a substitute for platinum.
• Used in manufacturing super alloys and electron-beam melting.
• Used in metallurgical, machinery processing, glass and ceramic industries.
• Used as a superalloy additive in nickel-based alloys.
• Used for sputtering targets in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD).

integrated circuit

Tantalum Sputtering Target Specifications:

Part No.

Material

Size

Purity

TA0201

Tantalum

1.00" Dia. x 0.125" Thick

99.95%

TA0202

Tantalum

1.00" Dia. x 0.250" Thick

99.95%

TA0203

Tantalum

2.00" Dia. x 0.125" Thick

99.95%

TA0204

Tantalum

2.00" Dia. x 0.250" Thick

99.95%

TA0205

Tantalum

3.00" Dia. x 0.250" Thick

99.95%

TA0206

Tantalum

3.00" Dia. x 0.250" Thick

99.95%

TA0207

Tantalum

4.00" Dia. x 0.250" Thick

99.95%

TA0208

Tantalum

4.00" Dia. x 0.250" Thick

99.95%

TA0209

Tantalum

5.00" Dia. x 0.250" Thick

99.95%

TA0210

Tantalum

5.00" Dia. x 0.250" Thick

99.95%

Need a tailor-made solution? Contact us.

We also provide high quality Tantalum Disc.

Other information for your reference
Chemical Composition:

Element

R05200 (%,Max)

R05400 (%,Max)

C

0.01

0.01

O

0.015

0.03

N

0.01

0.01

H

0.0015

0.0015

Fe

0.01

0.01

Mo

0.02

0.02

Nb

0.1

0.1

Ni

0.01

0.01

Si

0.005

0.005

Ti

0.01

0.01

W

0.05

0.05


Tantalum and Tantalum Alloy

  • R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both
  • R05400, unalloyed tantalum, powder-metallurgy consolidation.
  • R05255, tantalum alloy, 90 % tantalum, 10 % tungsten, electron-beam furnace of vacuum-arc melt, or both.
  • R05252, tantalum alloy, 97.5 % tantalum, 2.5 % tungsten, electron-beam furnace or vacuum-arc melt, or both.
  • R05240, tantalum alloy, 60 % tantalum, 40 % nobium, electron-beam furnace or vacuum-arc melt.

 
Packaging:
Our tantalum sputtering targets are carefully handled during storage and transportation to preserve the quality of our products in their original condition.

Material Safety Data Sheet (MSDS) for your reference!



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