Catalog No. | BN4001 |
---|---|
Type | Substrate: copper foil. |
Size | 5*10, 10*10, 10*20 (mm) |
Method | Chemical Vapor Deposition (CVD) |
We provide h-BN Films on various substrates, such as: SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Graphene Films.
Related products: Nickel Telluride CVD Film (NiTe2), Tungsten Diselenide CVD Film (WSe2), Bismuth Selenide CVD Film (Bi2Se3)
SAM provide h-BN Films on copper foil. Copper-based hexagonal boron nitride films are deposited by chemical vapor deposition (CVD) on high-purity copper foils with single-layer and multi-layer h-BN films. Single-layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct bandgap of 6 eV with strong ionic bonding between B-N atoms.
Type |
Substrate: copper foil. |
Size (mm) |
5*10, 10*10, 10*20 |
Crystal Structure |
Hexagonal Phase |
Method |
Chemical Vapor Deposition (CVD) |
Our Hexagonal Boron Nitride Film (h-BN Film) is carefully handled during storage and transportation to preserve the quality of our product in its original condition.
BN1508 Boron Nitride Powder (BN Powder) (CAS No. 10043-11-5)
HBN1659 Hot Pressed Boron Nitride Crucible (H-BN Crucible)
BN1662 Boron Nitride Crucible (BN Crucible)
BN1809 Boron Nitride Ceramic BN-AlN
BN1810 Boron Nitride Ceramic BN-BO
BN1811 Boron Nitride Composite Ceramic BN-SZ
BN4441 Boron Nitride Nanosheet (BN Nanosheet) (CAS No. 7440-42-8)
PBN4539 Pyrolytic Boron Nitride (PBN) Boat
BN4540 ZSBN Nozzle
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