BN4001 Hexagonal Boron Nitride Film (h-BN Film)

Catalog No. BN4001
Type Substrate: copper foil.
Size 5*10, 10*10, 10*20 (mm)
Method Chemical Vapor Deposition (CVD)

We provide h-BN Films on various substrates, such as: SiO2/Si, Quartz, Sapphire, Silicon wafer, PET, etc. Stanford Advanced Materials (SAM) has rich experience in manufacturing and supplying high-quality Graphene Films.

Related products: Nickel Telluride CVD Film (NiTe2), Tungsten Diselenide CVD Film (WSe2), Bismuth Selenide CVD Film (Bi2Se3)

Hexagonal Boron Nitride Film (h-BN Film) Description

SAM provide h-BN Films on copper foil. Copper-based hexagonal boron nitride films are deposited by chemical vapor deposition (CVD) on high-purity copper foils with single-layer and multi-layer h-BN films. Single-layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct bandgap of 6 eV with strong ionic bonding between B-N atoms.

Hexagonal Boron Nitride Film (h-BN Film) Specification

Type

Substrate: copper foil.

Size (mm)

5*10, 10*10, 10*20

Crystal Structure

Hexagonal Phase

Method

Chemical Vapor Deposition (CVD)

Hexagonal Boron Nitride Film (h-BN Film) Packaging

Our Hexagonal Boron Nitride Film (h-BN Film) is carefully handled during storage and transportation to preserve the quality of our product in its original condition.

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